Edwards
Highland Scientific - Last Updated: 04/02/2014
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Edwards QDP40
Four-stage, positive displacement rotary dry pump.
Ideal for the corrosive enviroment of semiconductor processing. Applications ranging from light duty loadlock and sputtering to more demanding processes like plasma, etch, PECVD etc.
Ideal for the corrosive enviroment of semiconductor processing. Applications ranging from light duty loadlock and sputtering to more demanding processes like plasma, etch, PECVD etc.
Edwards QDP80
Four-stage, positive displacement rotary dry pump.
Pumping speed: 91.5CMH
Ultimate Vacuum: 3x10-2 m/bar
Inlet flange: ISO63
Outlet flange: NW40
Pumping speed: 91.5CMH
Ultimate Vacuum: 3x10-2 m/bar
Inlet flange: ISO63
Outlet flange: NW40
Dry Pump
Pumping speed: 80CMH
Ultimate Vacuum: 3x10-2 m/bar
Inlet flange: ISO63 Bolted
Outlet flange: NW40
Pumping speed: 80CMH
Ultimate Vacuum: 3x10-2 m/bar
Inlet flange: ISO63 Bolted
Outlet flange: NW40
Edwards IQDP80
Edwards GV80
Dry Pump
Pumping speed: 92CMH
Ultimate Vacuum: 0.1 m/bar
Inlet flange: ISO40
Outlet flange: KF40
Pumping speed: 92CMH
Ultimate Vacuum: 0.1 m/bar
Inlet flange: ISO40
Outlet flange: KF40
Edwards XDS35i
Scroll Pump
Pumping speed: 43CMH
Ultimate Vaccum: 1x10-2 m/bar
Inlet flange: KF40
Outlet flange: KF25
Pumping speed: 43CMH
Ultimate Vaccum: 1x10-2 m/bar
Inlet flange: KF40
Outlet flange: KF25
Edwards XDS5
Scroll Pump
Pumping speed: 4.8 CMH
Ultimate Vaccum: 7x10-2 m/bar
Inlet flange: KF25
Outlet flange: KF25
Pumping speed: 4.8 CMH
Ultimate Vaccum: 7x10-2 m/bar
Inlet flange: KF25
Outlet flange: KF25
Dry Pumps